@article{e9be5ea6e029446a8094748036658076,
title = "Instantaneous cleaning of silicon substrates by mesoplasma for high-rate and low-temperature epitaxy",
keywords = "Epitaxy, Morphology, Plasma chemical vapor deposition (plasma CVD), Plasma cleaning, Plasma surface interactions, Silicon, Thin films",
author = "Diaz, {J. M.A.} and K. Harima and M. Kambara and T. Yoshida",
year = "2009",
month = dec,
day = "30",
doi = "10.1016/j.tsf.2009.07.163",
language = "English",
volume = "518",
pages = "976--980",
journal = "Thin Solid Films",
issn = "0040-6090",
publisher = "Elsevier B.V.",
number = "3",
}