Fabrication of heteroepitaxial Si films on sapphire substrates using mesoplasma CVD

M. Sawayanagi; J. M. Diaz; M. Kambara; T. Yoshida

doi:10.1016/j.surfcoat.2006.07.134

Fabrication of heteroepitaxial Si films on sapphire substrates using mesoplasma CVD

M. Sawayanagi, J. M. Diaz, M. Kambara, T. Yoshida

University of Tokyo

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	5592-5595
Number of pages	4
Journal	Surface and Coatings Technology
Volume	201
Issue number	9-11 SPEC. ISS.
DOIs	https://doi.org/10.1016/j.surfcoat.2006.07.134
State	Published - Feb 26 2007
Externally published	Yes

ASJC Scopus Subject Areas

General Chemistry
Condensed Matter Physics
Surfaces and Interfaces
Surfaces, Coatings and Films
Materials Chemistry

Keywords

Chemical vapor deposition
Heteroepitaxy
Mesoplasma
Silicon
Silicon on sapphire

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10.1016/j.surfcoat.2006.07.134

Cite this

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title = "Fabrication of heteroepitaxial Si films on sapphire substrates using mesoplasma CVD",

keywords = "Chemical vapor deposition, Heteroepitaxy, Mesoplasma, Silicon, Silicon on sapphire",

author = "M. Sawayanagi and Diaz, {J. M.} and M. Kambara and T. Yoshida",

year = "2007",

month = feb,

day = "26",

doi = "10.1016/j.surfcoat.2006.07.134",

language = "English",

volume = "201",

pages = "5592--5595",

journal = "Surface and Coatings Technology",

issn = "0257-8972",

publisher = "Elsevier B.V.",

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TY - JOUR

T1 - Fabrication of heteroepitaxial Si films on sapphire substrates using mesoplasma CVD

AU - Sawayanagi, M.

AU - Diaz, J. M.

AU - Kambara, M.

AU - Yoshida, T.

PY - 2007/2/26

Y1 - 2007/2/26

KW - Chemical vapor deposition

KW - Heteroepitaxy

KW - Mesoplasma

KW - Silicon

KW - Silicon on sapphire

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U2 - 10.1016/j.surfcoat.2006.07.134

DO - 10.1016/j.surfcoat.2006.07.134

M3 - Article

AN - SCOPUS:33846500625

SN - 0257-8972

VL - 201

SP - 5592

EP - 5595

JO - Surface and Coatings Technology

JF - Surface and Coatings Technology

IS - 9-11 SPEC. ISS.

ER -

Fabrication of heteroepitaxial Si films on sapphire substrates using mesoplasma CVD

ASJC Scopus Subject Areas

Keywords

Access to Document

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