@article{a3edf0e71dc749aaba9c68abf6c0469c,
title = "Evolution of surface morphology with hydrogen dilution during silicon epitaxy by mesoplasma CVD",
keywords = "Epitaxial growth, Plasma CVD, Silicon thin films, X-ray scattering",
author = "Diaz, {Jose Mario A.} and Makoto Kambara and Toyonobu Yoshida",
year = "2009",
doi = "10.1109/TPS.2009.2024780",
language = "English",
volume = "37",
pages = "1723--1729",
journal = "IEEE Transactions on Plasma Science",
issn = "0093-3813",
publisher = "Institute of Electrical and Electronics Engineers Inc.",
number = "9 SPEC. ISS. PART 1",
}