Enhancing Segmenter with Masked Patch Modeling: Development of the Mask-Segmenter Model

Vaughn Nephi F. Fajardo; Karl Raphael L. Paradeza; Raphael B. Alampay; Patricia Angela R. Abu

doi:10.1145/3698263.3698269

Enhancing Segmenter with Masked Patch Modeling: Development of the Mask-Segmenter Model

Vaughn Nephi F. Fajardo, Karl Raphael L. Paradeza, Raphael B. Alampay, Patricia Angela R. Abu

Department of Information Systems and Computer Science

Ateneo de Manila University

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English
Title of host publication	MLPR 2024 - Proceedings of the 2024 2nd International Conference on Machine Learning and Pattern Recognition
Publisher	Association for Computing Machinery
Pages	34-40
Number of pages	7
ISBN (Electronic)	9798400710001
DOIs	https://doi.org/10.1145/3698263.3698269
State	Published - Dec 16 2024
Event	2nd International Conference on Machine Learning and Pattern Recognition, MLPR 2024 - Osaka, Japan Duration: Aug 2 2024 → Aug 4 2024

Publication series

Name	ACM International Conference Proceeding Series

Conference

Conference	2nd International Conference on Machine Learning and Pattern Recognition, MLPR 2024
Country/Territory	Japan
City	Osaka
Period	8/2/24 → 8/4/24

ASJC Scopus Subject Areas

Human-Computer Interaction
Computer Networks and Communications
Computer Vision and Pattern Recognition
Software

Keywords

Brain Tumor Segmentation
Deep Learning
MRI
Sobel Edge Detection

Access to Document

10.1145/3698263.3698269

Cite this

Fajardo, V. N. F., Paradeza, K. R. L., Alampay, R. B., & Abu, P. A. R. (2024). Enhancing Segmenter with Masked Patch Modeling: Development of the Mask-Segmenter Model. In MLPR 2024 - Proceedings of the 2024 2nd International Conference on Machine Learning and Pattern Recognition (pp. 34-40). (ACM International Conference Proceeding Series). Association for Computing Machinery. https://doi.org/10.1145/3698263.3698269

Enhancing Segmenter with Masked Patch Modeling: Development of the Mask-Segmenter Model. / Fajardo, Vaughn Nephi F.; Paradeza, Karl Raphael L.; Alampay, Raphael B. et al.
MLPR 2024 - Proceedings of the 2024 2nd International Conference on Machine Learning and Pattern Recognition. Association for Computing Machinery, 2024. p. 34-40 (ACM International Conference Proceeding Series).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Fajardo, VNF, Paradeza, KRL, Alampay, RB & Abu, PAR 2024, Enhancing Segmenter with Masked Patch Modeling: Development of the Mask-Segmenter Model. in MLPR 2024 - Proceedings of the 2024 2nd International Conference on Machine Learning and Pattern Recognition. ACM International Conference Proceeding Series, Association for Computing Machinery, pp. 34-40, 2nd International Conference on Machine Learning and Pattern Recognition, MLPR 2024, Osaka, Japan, 8/2/24. https://doi.org/10.1145/3698263.3698269

Fajardo VNF, Paradeza KRL, Alampay RB, Abu PAR. Enhancing Segmenter with Masked Patch Modeling: Development of the Mask-Segmenter Model. In MLPR 2024 - Proceedings of the 2024 2nd International Conference on Machine Learning and Pattern Recognition. Association for Computing Machinery. 2024. p. 34-40. (ACM International Conference Proceeding Series). doi: 10.1145/3698263.3698269

Fajardo, Vaughn Nephi F. ; Paradeza, Karl Raphael L. ; Alampay, Raphael B. et al. / Enhancing Segmenter with Masked Patch Modeling : Development of the Mask-Segmenter Model. MLPR 2024 - Proceedings of the 2024 2nd International Conference on Machine Learning and Pattern Recognition. Association for Computing Machinery, 2024. pp. 34-40 (ACM International Conference Proceeding Series).

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author = "Fajardo, {Vaughn Nephi F.} and Paradeza, {Karl Raphael L.} and Alampay, {Raphael B.} and Abu, {Patricia Angela R.}",

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Enhancing Segmenter with Masked Patch Modeling: Development of the Mask-Segmenter Model

Publication series

Conference

ASJC Scopus Subject Areas

Keywords

Access to Document

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Cite this