@article{cfc084b8dc4a4501867543a9ef4b2af6,
title = "Electrical properties of thick epitaxial silicon films deposited at high rates and low temperatures by mesoplasma chemical vapor deposition",
keywords = "Chemical vapor deposition, Epitaxy, Mesoplasma, Rf plasma, Silicon",
author = "Diaz, \{Jose Mario A.\} and Munetaka Sawayanagi and Makoto Kambara and Toyonobu Yoshida",
year = "2007",
month = aug,
day = "6",
doi = "10.1143/JJAP.46.5315",
language = "English",
volume = "46",
pages = "5315--5317",
journal = "Japanese Journal of Applied Physics",
issn = "0021-4922",
publisher = "Institute of Physics",
number = "8 A",
}